Something went wrong
Current region
Global
EN - ENGLISH
Global
Current region
Global
+49 (0) 36601 592 - 0
Current region
Global
shop@microhybrid.com

Cart

Your cart is empty.

Contact us!

Your contact to Micro-Hybrid

T: +49 (0) 36601 592 - 0

E: sales@microhybrid.com

Contact us!

Your contact to Micro-Hybrid

T: +49 (0) 36601 592 - 0

E: sales@microhybrid.com

product-detail-img

C-MOSI based IR-emitter in SMD-package, Si ARC-window, filling gas air

JSIR340-4-CB-0-S5.0-Air-A7 | 6344.07-4.10

IR-emitter with high modulation frequency for high volume markets in NDIR gas analysis, transmission 2.5-15.5 µm

  • Time constant of 15 ms,
  • High durability,
  • Perfect in combination with our IR-detectors
  • from
    58,61 €
    Available
    Save for later

    Bulk prices

    starting from 10 98,22 €
    starting from 25 76,59 €
    starting from 50 58,61 €

    You are currently ordering as a guest. To enjoy all the benefits of our Plattform such as higher quantities, customized prices, inventory, tracking (order status), order overview or change of repository etc. please log in to My Micro Hybrid


    Description

    The cost-efficient infrared emitter JSIR340-4 is optimized for NDIR gas analysis and other infrared measurement applications such as DIR spectroscopy, ATR spectroscopy or PAS spectroscopy. The membrane of the CMOS based IR emitters reaches membrane temperatures of up to 800 °C. It enables long-term stable radiation output for industrial applications to control and monitor process gases at ambient temperatures between -20 and 85 °C.
    The silicon filter optimizes the radiation output in the wavelength range from UV to 14 µm.
    As an SMD package, the JSIR340 is particularly suitable for automated pick-and-place assembly and high volume production.

    The MEMS chip used in our IR emitters consists of a multilayer hot plate diaphragm containing a high temperature stable metal C-MOSI layer. The emitter chip has an active area of 2.2 x 2.2 mm2 and is based on a silicon substrate with a back-etched membrane. All thin film processes are performed using standard MEMS processes and CMOS compatible materials. The active C-MOSI resistive layer is protected against aging and environment.

    Our sales team will be happy to advise you on customization and scale prices for high volumes. For more technical information please refer to the datasheet.

    Technical Data

    Active area 2,2 x 2,2 mm²
    Hot resistance 17 ± 5 Ω
    Temperature coefficient 1,000 ppm/K
    Time constant 11.5 ms
    Nominal power consumption 650 mW
    Operating voltage 3.3 V
    Operating current 200 mA
    Recommended operating mode
    Constant power mode
    Estimated operating life
    Temperature of active area 500 ± 30 °C
    Maximum enclosure temperature 85 °C
    Emitter window silicon with anti reflective coating
    Socket SMD